CV

Curriculum vitae

Person Identification
  • Daniel Franta, MA PhD, born February 14, 1970
Workplace
  • Department of Physical Electronics
    Faculty of Science, Masaryk University
Employment Position
  • scientist
Education and Academic Qualifications
  • 2000: Ph.D. in field Wave and Particle Optics at Masaryk University, thesis "Interaction of Light with non-ideal layered systems"
  • 1994: Mgr. (M.A.) in field Physics at Masaryk University, thesis "Scattering of Light by Layered Systems Containing Stochastic Rough Boundaries"
Employment Summary
  • since 1997: Masaryk University, scientist
Academical Stays
  • 2003: Institute of Semiconductor Physics, Johannes Kepler University, Linz, Austria (10 days)
  • 2002: Laboratoire de Magnétisme et d'Optique, Université de Versailles Saint-Quentin-en-Yvelines, Versailles, France (3 months)
  • 2002: Institute of Semiconductor Physics, Johannes Kepler University, Linz, Austria (10 days)
  • 2001: Institute of Semiconductor Physics, Johannes Kepler University, Linz, Austria (2 times 10 days)
  • 2000: Institute of Semiconductor Physics, Johannes Kepler University, Linz, Austria (10 days)
Selected Publications
  • FRANTA, Daniel, David NEČAS, Lenka ZAJÍČKOVÁ, Ivan OHLÍDAL, Jiří STUCHLÍK a Dagmar CHVOSTOVA. Application of sum rule to the dispersion model of hydrogenated amorphous silicon. Thin Solid Films. Lausanne: Elsevier Science, 2013, roč. 539, Jul, s. 233-244. ISSN 0040-6090. doi:10.1016/j.tsf.2013.04.012. URL info
  • FRANTA, Daniel, David NEČAS, Lenka ZAJÍČKOVÁ, Ivan OHLÍDAL a Jiří STUCHLÍK. Advanced modeling for optical characterization of amorphous hydrogenated silicon films. Thin Solid Films. Lausanne: Elsevier Science, 2013, roč. 541, Aug, s. 12-16. ISSN 0040-6090. doi:10.1016/j.tsf.2013.04.129. URL info

2014/03/08

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