Project information
Multi-pulse HiPIMS for increase of deposition rate

Project Identification
Project Period
7/2020 - 12/2020
Investor / Pogramme / Project type
Masaryk University
MU Faculty or unit
Faculty of Science
Cooperating Organization
Institute of Physics of the ASCR, v. v. i.

The project aims to increase the deposition rate in HiPIMS discharge, which is significantly low compared to standard direct current magnetron sputtering (dcMS) while maintaining sufficient ionization of the sputtered species, which is considerably higher compared to dcMS. The low deposition rate is a significant disadvantage of HiPIMS as it increases the cost of deposited layers. Therefore, a higher deposition rate will make the deposition process more economical and efficient, maintaining enhanced properties of deposited thin films.

The sub-project directly fulfills research topic of "Advanced Materials and Nanotechnology".

Sustainable Development Goals

Masaryk University is committed to the UN Sustainable Development Goals, which aim to improve the conditions and quality of life on our planet by 2030.

Sustainable Development Goal No.  9 – Industry, innovation and infrastructure Sustainable Development Goal No.  12 – Responsible consumption and production Sustainable Development Goal No.  17 – Partnerships for the goals

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