Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges

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Project Identification
Project Period
1/2007 - 12/2011
Investor / Pogramme / Project type
Czech Science Foundation
MU Faculty or unit
Faculty of Science
PECVD, dual frequency capacitive discharges DF CCP, nanostrukturovaný DLC, termomechanická kapacita
Cooperating Organization
Institute of Nuclear Physics
Institute of Scientific Instruments of the ASCR, v. v. i.
Czech Meteorological Institute

The aim of the present project is to develop a new deposition system based on application of dual-frequency capacitive plasma (DFCCP) for preparation of themally stable nanostructured diamod-like carbon (NDLC) films. With combination of high frequency excitation (ensuring plasma stability and its high density) and low frequency excitation (controlling the ion energy) we will achieve controlled growth of NDLC films. The objective of the study is to find the optimum combination of the high and low frequency (continuous or pulsed) excitation enabling to cover uneven and stepped substrate surfaces and significant lowering of the internal stress in films. Complex diagnostics and computer simulation of the DFCCP are planned in order to understand the processes of the film growth. The NDLC films will be exstensively studied from the point of view of their structure (RBS, ERDA, TOF ERDA, HRTEM, SEM etc.) as well as properties (micro- and nanoindentation, elipsometry, spectrophotometry, etc.). Moreover, the thermal stability of NDLC films will be studied using thermal desorption spectroscopy.


Total number of publications: 70

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