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New procedures for thin film deposition by reaktive magnetron sputtering
- Project Identification
- Project Period
- 1/2008 - 12/2008
- Investor / Pogramme / Project type
- Ministry of Education, Youth and Sports of the CR
- MU Faculty or unit
- Faculty of Science
- reactive magnetron sputtering, PVD
Main goal of this cooperation is to develop powerfull diagnostics methods suitable for controling of physical processes taking place in PVD reactor.